Publikationen von A. von Keudell

von Keudell, A.; Schwarz-Selinger, T.; Jacob, W.: Simultaneous Interaction of Methyl Radicals and Atomic Hydrogen with Amorphous Hydrogenated Carbon Films. Journal of Applied Physics 89, S. 2979 - 2986 (2001)

von Keudell, A.; Schwarz-Selinger, T.; Jacob, W.; Stevens, A.: Surface reactions of hydrocarbon radicals: suppression of the re-deposition in fusion experiments via a divertor liner. Journal of Nuclear Materials 290-293, S. 231 - 237 (2001)

Hopf, C.; Schwarz-Selinger, T.; Jacob, W.; von Keudell, A.: Surface loss probabilities of hydrocarbon radicals on amorphous hydrogenated carbon film surfaces. Journal of Applied Physics 87, S. 2719 - 2725 (2000)

Jacob, W.; von Keudell, A.; Schwarz-Selinger, T.: Infrared Analysis of Thin Films: Amorphous, Hydrogenated Carbon on Silicon. Brazilian Journal of Physics 30 (3), S. 508 - 516 (2000)

Schwarz-Selinger, T.; von Keudell, A.; Jacob, W.: Novel method for absolute quantification of the flux and angular distribution of a radical source for atomic hydrogen. Journal of Vacuum Science and Technology A 18, S. 995 - 1001 (2000)

von Keudell, A.; Schwarz-Selinger, T.; Meier, M.; Jacob, W.: Direct Identification of the Synergism between Methyl Radicals and Atomic Hydrogen during Growth of Amorphous Hydrogenated Carbon Films. Applied Physics Letters 76, S. 676 - 678 (2000)

Hopf, C.; Letourneur, K.; Jacob, W.; Schwarz-Selinger, T.; von Keudell, A.: Surface loss probabilities of the dominant neutral precursors for film growth in methane and acetylene discharges. Applied Physics Letters 74 (25), S. 3800 - 3802 (1999)

Keudell, A. v.; Abelson, J. R.: Thermally induced changes in the hydrogen microstructure of amorphous hydrogenated silicon films, analyzed using in situ real time infrared spectroscopy. Japanese Journal of Applied Physics. Part 1 38 (7A), S. 4002 - 4006 (1999)

Keudell, A. v.; Abelson, J. R.: Direct insertion of SiH₃ radicals into strained Si-Si surface bonds during plasma deposition of hydrogenated amorphous silicon films. Physical Review B 59 (8), S. 5791 - 5798 (1999)

Landkammer, B.; Keudell, A. v.; Jacob, W.: Erosion of thin hydrogenated carbon films in oxygen, oxygen/hydrogen and water plasmas. Journal of Nuclear Materials 264 (1-2), S. 48 - 55 (1999)

Schwarz-Selinger, T.; von Keudell, A.; Jacob, W.: Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties. Journal of Applied Physics 86 (7), S. 3988 - 3996 (1999)

von Keudell, A.; Hopf, C.; Schwarz-Selinger, T.; Jacob, W.: Surface loss probabilities of hydrocarbon radicals on amorphous hydrogenated carbon film surfaces: Consequences for the formation of re-deposited layers in fusion experiments. Nuclear Fusion 39 (10), S. 1451 - 1462 (1999)

Annen, A.; Saß, M.; Beckmann, R.; von Keudell, A.; Jacob, W.: Structure of Plasma-Deposited Amorphous Hydrogenated Boron-Carbon Thin Films. Thin Solid Films 312, S. 147 - 155 (1998)

Keudell, A. v.; Abelson, J. R.: The interaction of atomic hydrogen with very thin amorphous hydrogenated silicon films analyzed using in situ real time infrared spectroscopy: Reaction rates and the formation of hydrogen platelets. Journal of Applied Physics 84 (1), S. 489 - 495 (1998)

Keudell, A. v.: Surface reactions during plasma-enhanced chemical vapor deposition of hydrocarbon films. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 125 (1-4), S. 323 - 327 (1997)

Keudell, A. v.; Jacob, W.: Interaction of hydrogen plasmas with hydrocarbon films, investigated by infrared spectroscopy using an optical cavity substrate. Journal of Vacuum Science and Technology A 15 (2), S. 402 - 407 (1997)

Keudell, A. v.; Jacob, W.: Surface relaxation during plasma-enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry. Journal of Applied Physics 81 (3), S. 1531 - 1535 (1997)

von Keudell, A.; Annen, A.; Dose, V.: Multivariate analysis of noise-corrupted PECVD data. Thin Solid Films 307, S. 65 - 70 (1997)

Annen, A.; Keudell, A. v.; Jacob, W.: Erosion of amorphous hydrogenated boron-carbon thin films. Journal of Nuclear Materials 231 (1-2), S. 151 - 154 (1996)

Annen, A.; Keudell, A. v.; Jacob, W.: Erosion of Amorphous Hydrogenated Boron-Carbon Thin Films. Journal of Nuclear Materials 231, s. 1-2, S. 151 - 154 (1996)