Publikationen von W. Jacob

Bauer, M.; Schwarz-Selinger, T.; Jacob, W.; von Keudell, A.: Growth precursors for a-C:H film deposition in a pulsed inductively coupled methane plasmas. Journal of Applied Physics 98, 073302 (2005)

Hopf, C.; Jacob, W.: Bombardment of graphite with hydrogen isotopes: A model for the energy dependence of the chemical sputtering yield. Journal of Nuclear Materials 342, S. 141 - 147 (2005)

Hopf, C.; Jacob, W.; von Keudell, A.: Ion-induced surface activation, chemical sputtering, and hydrogen release during plasma-assisted hydrocarbon film growth. Journal of Applied Physics 97, 094904 (2005)

Jacob, W.: Redeposition of hydrocarbon layers in fusion devices. Journal of Nuclear Materials 337-339, S. 839 - 846 (2005)

Jacob, W.; Hopf, C.; Schlüter, M.: Chemical sputtering of carbon by nitrogen ions. Applied Physics Letters 86, 204103 (2005)

von Keudell, A.; Jacob, W.: Elementary processes in plasma-surface interaction: H-atom and ion-induced chemisorption of methyl on hydrocarbon film surfaces. Progress in Surface Science 76, S. 21 - 54 (2004)

Hopf, C.; von Keudell, A.; Jacob, W.: Chemical sputtering of hydrocarbon films. Journal of Applied Physics 94 (4), S. 2373 - 2380 (2003)

Hopf, C.; von Keudell, A.; Jacob, W.: Direct verification of the ion-neutral synergism during hydrocarbon film growth. Journal of Applied Physics 93 (6), S. 3352 - 3358 (2003)

Hopf, C.; von Keudell, A.; Jacob, W.: The influence of hydrogen ion bombardment on plasma-assisted hydrocarbon film growth. Diamond and Related Materials 12 (2), S. 85 - 89 (2003)

Jacob, W.; Hopf, C.; von Keudell, A.; Meier, M.; Schwarz-Selinger, T.: Particle-beam experiment to study heterogeneous surface reactions relevant to plasma-assisted thin film growth and etching. Review of Scientific Instruments 74 (12), S. 5123 - 5136 (2003)

Matyash, K.; Schneider, R.; Bergmann, A.; Jacob, W.; Fantz, U.; Percher, P.: Modeling of hydrocarbon species in ECR methane plasmas. Journal of Nuclear Materials 313-316, S. 434 - 438 (2003)

Meier, M.; von Keudell, A.; Jacob, W.: Consequences of the temperature and flux dependent sticking coefficient of methyl radicals for nuclear fusion experiments. Nuclear Fusion 43 (1), S. 25 - 29 (2003)

Schwarz-Selinger, T.; Meier, M.; Hopf, C.; von Keudell, A.; Jacob, W.: Can plasma experiments unravel microscopic surface processes in thin film growth and erosion? Implications of particle–beam experiments on the understanding of a-C:H growth. Vacuum 71 (3), S. 361 - 376 (2003)

Hopf, C.; von Keudell, A.; Jacob, W.: Chemical sputtering of hydrocarbon films by low-energy Ar+ ion and H atom impact. Nuclear Fusion 42, S. L27 - L30 (2002)

Matyash, K.; Schneider, R.; Bergmann, A.; Jacob, W.; Fantz, U.; Pecher, P.: Modeling of ECR methane plasmas. Czechoslovak Journal of Physics 52 (Suppl. D), S. 515 - 521 (2002)

Rohde, D.; Pecher, R.; Kersten, H.; Jacob, W.; Hippler, R.: The energy influx during plasma deposition of amorphous hydrogenated carbon films. Surface & Coatings Technology 149 (2-3), S. 206 - 216 (2002)

Jacob, W.; von Keudell, A.; Schwarz-Selinger, T.: ERRATUM: Infrared Analysis of Thin Films: Amorphous, Hydrogenated Carbon on Silicon. Brazilian Journal of Physics 31, S. 109 (2001)

Maruyama, K.; Jacob, W.; Roth, J.: Formation of Hard Amorphous Hydrogenated Carbon Films with Low Hydrogen Concentration and their Erosion in Air. Japanese Journal of Applied Physics 40, S. 788 - 793 (2001)

Schwarz-Selinger, T.; Dose, V.; Jacob, W.; von Keudell, A.: Quantification of a radial beam source for methyl radicals. Journal of Vacuum Science and Technology. A 19, S. 101 - 107 (2001)

Vasquez-Borucki, S.; Achete, C. A.; Jacob, W.: Hydrogen Plasma Treatment of Poly(Ethylene Terephthalate) Surfaces. Surface and Coatings Technology 138, S. 256 - 263 (2001)